- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/22 - Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
Patent holdings for IPC class G03F 1/22
Total number of patents in this class: 577
10-year publication summary
|
44
|
45
|
54
|
48
|
55
|
83
|
47
|
47
|
53
|
10
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
149 |
| Applied Materials, Inc. | 16587 |
62 |
| Samsung Electronics Co., Ltd. | 131630 |
41 |
| Hoya Corporation | 2822 |
33 |
| ASML Netherlands B.V. | 6816 |
27 |
| Shin-Etsu Chemical Co., Ltd. | 5132 |
19 |
| Agc, Inc. | 4029 |
17 |
| Carl Zeiss SMT GmbH | 2646 |
16 |
| KLA-Tencor Corporation | 2574 |
10 |
| Fine Semitech Corp. | 22 |
9 |
| Intel Corporation | 45621 |
8 |
| ASML Holding N.V. | 542 |
8 |
| KLA Corporation | 1223 |
8 |
| International Business Machines Corporation | 60644 |
7 |
| FUJIFILM Corporation | 27102 |
7 |
| GLOBALFOUNDRIES U.S. Inc. | 6459 |
7 |
| SK Hynix Inc. | 11030 |
6 |
| Lam Research Corporation | 4775 |
6 |
| Kioxia Corporation | 9847 |
6 |
| Samsung Display Co., Ltd. | 30585 |
5 |
| Other owners | 126 |